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MF139100 - SEMI MF1391 - Test Method for Substitutional Atomic Carbon Content of Silicon by Infrared Absorption Revision:SEMI MF1391-0704 - Superseded 注意:這個翻譯是一個參考版本。如果您在使用上,發現中文翻譯版本與英文原文版本產生任何差異或是不確定之處,請務必參考英文原文版本,並以英文原文版本為主,英文原文版本屬於正式和權威的版本。

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注意:這個翻譯是一個參考版本。如果您在使用上,發現中文翻譯版本與英文原文版本產生任何差異或是不確定之處,請務必參考英文原文版本,並以英文原文版本為主,英文原文版本屬於正式和權威的版本。

The guide may also be used for large particles not covered by existing particle-detection metrology

edge isolation etch

Bare glass substrates which can be used as array substrates

Panel manufacturers’ basis for equipment comparison will become clear

MF139100 - SEMI MF1391 - Test Method for Substitutional Atomic Carbon Content of Silicon by Infrared Absorption Revision:SEMI MF1391-0704 - Superseded 注意:這個翻譯是一個參考版本。如果您在使用上,發現中文翻譯版本與英文原文版本產生任何差異或是不確定之處,請務必參考英文原文版本,並以英文原文版本為主,英文原文版本屬於正式和權威的版本。This reference Test Method covers the determination of substitutional carbon concentration in single crystal silicon. Because carbon may also reside in interstitial lattice positions when in concentrations near the solid solubility limit, the results of this Test Method may not be a measure of the total carbon concentration at such concentrations. The useful range of carbon concentration measurable by this Test Method is from the maximum amount of

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